Canon FPA-6300ES6a KrF scanner

High-productivity KrF scanner for advanced chip processing.

Cropped front view - Canon FPA-6300ES6a KrF scanner

200 wph

with throughput upgrade


faster than previous models

≤ 90 nm


≤ 5 nm

overlay accuracy

Highly sophisticated mass production

Significantly reduce wafer handling, alignment and exposure processing times with advanced technologies. The Canon FPA-6300ES6a is designed for high volume production of devices such as microprocessors and colour filters.

Save time

Reticle and Wafer Stages improve productivity, alignment and wafer handling time.

Pinpoint accuracy

Overlay accuracy of less than 5 nm thanks to advanced stage-control technologies.


Options and upgrades support next-generation semiconductor manufacturing.

Front view - Canon FPA-6300ES6a KrF scanner

Product Specifications


≤ 90 nm

Wafer size

300 mm


≥ 200 wafers per hour *

Exposure area

26 mm x 33mm

Overlay accuracy

≤ 5 nm, with overlay upgrade

Numerical Aperture (NA)

0.50 ~ 0.86

* - 300mm wfer, 98 shots, with Options

Full view close crop - Canon FPA-6300ES6a KrF scanner
Find out how the Canon FPA-6300ES6a KrF scanner can transform your semiconductor manufacturing

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